Innovative Techniques Push Microchip Miniaturization Beyond Visible Limits
TL;DR Summary
Johns Hopkins researchers have developed a new, precise, and cost-effective process using advanced B-EUV lithography and novel metal-organic resists to create microchips with circuits so small they are invisible to the naked eye, potentially enabling smaller, faster, and more affordable electronics in the future.
Topics:science#b-euv-radiation#lithography#metal-organic-resists#microchips#nanotechnology#technology
- Circuits invisible to the naked eye: New technique shrinks microchips beyond current size limits Phys.org
- Beyond Ultraviolet Light, a New Lithographic Resist Material Could Help Keep Moore's Law on Track Hackster.io
- Johns Hopkins team develops metal-organic resist to print sub-10nm chips - CHOSUNBIZ Chosun Biz
- New chemistry shrinks microchips past the limits of human sight Interesting Engineering
- Scientists Crack Code for Invisible Circuits in Next-Gen Chips ScienceBlog.com
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