Revolutionizing Nanolithography with X-Photon 3D Technology
Researchers have developed a technique called X-photon 3D nanolithography, which uses ultra-short laser pulses to create complex three-dimensional structures at the micro- and nanoscale. By tuning the wavelength of the laser, the researchers were able to achieve an interplay of photophysical mechanisms that resulted in a 10-fold increase in the dynamic fabrication window. They also observed a non-trivial energy deposition by X-photon absorption, which allowed for control over the voxel aspect ratio and improved 3D nanoprinting efficiency. This technique has applications in various fields such as micro-optics, nanophotonic devices, metamaterials, integrated chips, and tissue engineering. Further investigations are needed to understand the mechanism of heat accumulation and optimize parameters for high-throughput applications.