"Revitalizing Deep Ultraviolet Laser Performance with Upgraded Crystals"
Originally Published 1 year ago — by Phys.org
Researchers at the Chinese Academy of Sciences have achieved a significant breakthrough in deep ultraviolet (DUV) laser technology by generating a high-power, narrow linewidth solid-state DUV laser at 193 nm using a two-stage sum frequency generation process employing LBO crystals. This innovation, known as the "hybrid ArF excimer laser," offers enhanced coherence and narrow linewidth, leading to improved performance in high-throughput interference lithography and direct processing of various materials with minimal thermal impact. The research not only pushes the boundaries of DUV laser technology but also holds promise for revolutionizing applications across scientific and industrial domains.